| 摘要 |
PROBLEM TO BE SOLVED: To separate and directly measure radical species in plasma in plasma treatment equipment to precisely grasp a change in condition in the vacuum chamber. SOLUTION: The plasma treatment equipment has a treatment chamber 201, a means for supplying the treatment chamber with a treatment gas, an evacuation means 208 for decompressing the treatment chamber, a treated object placement pedestal 204 for placing a treated object 202, and a high-frequency power source 206 for producing plasma which has a thickness monitor 211 for measuring a thickness that accumulates through a filter having fine pores with different aspect ratios. COPYRIGHT: (C)2009,JPO&INPIT
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