| 摘要 |
FIELD: construction. ^ SUBSTANCE: polishing suspension includes fluid medium and abrasive material in the form of particles, including soft abrasive particles, hard abrasive particles and colloid particles of silicon dioxide. Hardness of soft abrasive particles in Mohs scale is not more than 8, hardness of hard abrasive particles in Mohs scale is not less than 8, weight ration soft to hard abrasive particles is not less than 2:1, and suspension is partially flocculated and includes agglomerates with soft abrasive particles, hard abrasive particles and colloid particles of silicon dioxide. Also invention claims method of ceramic part polishing using claimed suspension. ^ EFFECT: high speed and enhanced quality of polishing. ^ 17 cl, 1 tbl, 4 dwg |
