发明名称 Lithographic apparatus with temperature sensor and device manufacturing method.
摘要 In an embodiment, a lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate, wherein the lithographic apparatus includes an air shower and a temperature sensor positioned near the air shower for measuring the temperature of an air stream in the air shower. The temperature sensor is a thermocouple sensor, e.g., of a thermopile arrangement type. The thermocouple sensor includes a plurality of thermocouples in series, wherein a cold junction and a hot junction are provided, the cold junction being connected to a heat sink, and the hot junction being positioned into the air stream of the air shower.
申请公布号 NL1036510(A1) 申请公布日期 2009.08.24
申请号 NL20091036510 申请日期 2009.02.03
申请人 ASML NETHERLANDS B.V. 发明人 TJARKO ADRIAAN RUDOLF VAN EMPEL;PAULUS BARTHOLOMEUS JOHANNES SCHAAREMAN
分类号 G03F7/20;G01K7/00 主分类号 G03F7/20
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