发明名称 |
INORGANIC GRADED BARRIER FILM AND METHODS FOR THEIR MANUFACTURE |
摘要 |
The present invention refers to a graded barrier film comprising a layered structure, wherein the layered structure comprises a first layer consisting of metal oxide; an intermediate layer consisting of metal nitride or metal oxynitride which is arranged on the first layer; and a third layer consisting of a metal oxide which is arranged on the intermediate layer. The present invention further refers to a sputtering method for manufacturing this graded barrier film and a device encapsulated with this graded barrier film. |
申请公布号 |
EP2274163(A1) |
申请公布日期 |
2011.01.19 |
申请号 |
EP20090739088 |
申请日期 |
2009.04.28 |
申请人 |
AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH |
发明人 |
RAMADAS, SENTHIL KUMAR;SHWE, ZIN MA |
分类号 |
B32B15/01;C23C14/00;C23C14/06;C23C14/08;C23C14/34;C23C14/35;H01L21/203 |
主分类号 |
B32B15/01 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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