| 摘要 |
PURPOSE: An exposure apparatus, a control method thereof, a device manufacturing method are provided to prevent the generation of physical driving of each hardware by changing the exposure amount adjusting area during step movement. CONSTITUTION: A substrate stage(300) including the substrate stage main body(302) is arranged on a body base(301). A substrate chuck(303) is arranged on the substrate stage main body. A disk stage(200) is arranged on the body base. An observation optical instrument(400) for observing the phase of a substrate(304) and a disk(203) is arranged.
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