| 摘要 |
<p>There is provided a light source apparatus for emitting light having a uniform intensity distribution. Such a light source apparatus for generating a light beam to be projected toward a fly-eye optical system included in an exposure apparatus includes a light source, and a mirror that reflects the light beam emitted from the light source toward the fly-eye optical system. Here, the mirror reflects the light beam from the light source such that the light beam projected toward the fly-eye optical system has a lower intensity in the edge portion than in the center portion. The mirror may reflect the light beam such that the intensity of the light beam projected toward the fly-eye optical system monotonically decreases in the edge portion. Furthermore, the mirror may reflect the light beam such that the intensity of the light beam projected toward the fly-eye optical system decreases down to zero in the edge portion.</p> |
