发明名称 Temperature control system and substrate processing apparatus
摘要 A temperature control system and a substrate processing apparatus are provided. The temperature control system for controlling temperatures of one or more members of a substrate processing apparatus includes a circulation system for circulating a first coolant to pass through the inside of each of the members, a heat exchanger for performing heat exchange between the first coolant of the circulation system and a second coolant, and a chiller for supplying the second coolant to the heat exchanger, wherein the circulation system includes a branch line for each of the members passing through the inside thereof, the branch line for each of the members is provided with a heating member for heating the first coolant supplied thereto, and the heat exchanger is installed in a room where the substrate processing apparatus is installed.
申请公布号 US7870751(B2) 申请公布日期 2011.01.18
申请号 US20060370858 申请日期 2006.03.09
申请人 TOKYO ELECTRON LIMITED 发明人 KANEKO KENGO;HAYAMI TOSHIHIRO
分类号 F25D17/00 主分类号 F25D17/00
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