发明名称 Corrector for charged-particle beam aberration and charged-particle beam apparatus
摘要 In a charged-particle beam apparatus having a high-accuracy and high-resolution focusing optical system for charged-particle beam, a group of coils are arranged along a beam emission axis to extend through the contour of radial planes each radiating from the beam emission axis representing a rotary axis and each having a circular arc which subtends a divisional angle resulting from division of a circumferential plane by a natural number larger than 2 so that a superposed magnetic field may be generated on the incident axis of the charged-particle beam and the trajectory of the charged-particle beam may be controlled by the superposed magnetic field.
申请公布号 US7872240(B2) 申请公布日期 2011.01.18
申请号 US20080183622 申请日期 2008.07.31
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 ITO HIROYUKI;SASAKI YUKO;HIGUCHI YOSHIYA;KAWASAKI TAKESHI
分类号 G21K1/08;H01J3/14;H01J3/26;H01J49/42 主分类号 G21K1/08
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