发明名称 |
Corrector for charged-particle beam aberration and charged-particle beam apparatus |
摘要 |
In a charged-particle beam apparatus having a high-accuracy and high-resolution focusing optical system for charged-particle beam, a group of coils are arranged along a beam emission axis to extend through the contour of radial planes each radiating from the beam emission axis representing a rotary axis and each having a circular arc which subtends a divisional angle resulting from division of a circumferential plane by a natural number larger than 2 so that a superposed magnetic field may be generated on the incident axis of the charged-particle beam and the trajectory of the charged-particle beam may be controlled by the superposed magnetic field.
|
申请公布号 |
US7872240(B2) |
申请公布日期 |
2011.01.18 |
申请号 |
US20080183622 |
申请日期 |
2008.07.31 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
ITO HIROYUKI;SASAKI YUKO;HIGUCHI YOSHIYA;KAWASAKI TAKESHI |
分类号 |
G21K1/08;H01J3/14;H01J3/26;H01J49/42 |
主分类号 |
G21K1/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|