发明名称 |
RAPID EXCHANGE DEVICE FOR LITHOGRAPHY RETICLES |
摘要 |
Provided is a method and apparatus for moving and exchanging reticles within a vacuum lithographic system with minimum particle generation and outgassing. In an example of the method, a first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm of the RED supports and buffers a second baseplate. The first and second baseplates are located substantially equidistant from an axis of rotation of the RED. |
申请公布号 |
KR20110004876(A) |
申请公布日期 |
2011.01.14 |
申请号 |
KR20107025812 |
申请日期 |
2009.04.14 |
申请人 |
ASML NETHERLANDS B.V.;ASML HOLDING N.V. |
发明人 |
LANSBERGEN ROBERT GABRIEEL MARIA;HARROLD GEORGE HILARY;JOHNSON RICHARD JOHN;VAN DER WEIJDEN HUGO JACOBUS GERARDUS |
分类号 |
G03F7/20;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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