发明名称 RAPID EXCHANGE DEVICE FOR LITHOGRAPHY RETICLES
摘要 Provided is a method and apparatus for moving and exchanging reticles within a vacuum lithographic system with minimum particle generation and outgassing. In an example of the method, a first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm of the RED supports and buffers a second baseplate. The first and second baseplates are located substantially equidistant from an axis of rotation of the RED.
申请公布号 KR20110004876(A) 申请公布日期 2011.01.14
申请号 KR20107025812 申请日期 2009.04.14
申请人 ASML NETHERLANDS B.V.;ASML HOLDING N.V. 发明人 LANSBERGEN ROBERT GABRIEEL MARIA;HARROLD GEORGE HILARY;JOHNSON RICHARD JOHN;VAN DER WEIJDEN HUGO JACOBUS GERARDUS
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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