发明名称 THIN-FILM TRANSISTOR, METHOD OF MANUFACTURING THE SAME, DISPLAY DEVICE, METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a thin film transistor hardly influenced by a photocurrent, and high in an on/off ratio.SOLUTION: In this bottom-gate bottom-contact (coplanar) thin film transistor, a channel formation region is superposed on a gate electrode; a first impurity semiconductor layer is provided between the channel formation region and a second impurity semiconductor layer which is in contact with a wiring layer; a semiconductor layer which serves as the channel formation region and the first impurity semiconductor layer preferably contact each other in a region where they overlap the gate electrode; and the first impurity semiconductor layer and the second impurity semiconductor layer preferably contact each other in a region where they do not overlap the gate electrode.
申请公布号 JP2011009730(A) 申请公布日期 2011.01.13
申请号 JP20100120563 申请日期 2010.05.26
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 MIYAIRI HIDEKAZU;JINBO YASUHIRO;GOTO HIROMITSU;MIZOGUCHI TAKAFUMI;FURUKAWA SHINOBU
分类号 H01L29/786;G02F1/1368;H01L21/336 主分类号 H01L29/786
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