发明名称 |
THIN-FILM TRANSISTOR, METHOD OF MANUFACTURING THE SAME, DISPLAY DEVICE, METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a thin film transistor hardly influenced by a photocurrent, and high in an on/off ratio.SOLUTION: In this bottom-gate bottom-contact (coplanar) thin film transistor, a channel formation region is superposed on a gate electrode; a first impurity semiconductor layer is provided between the channel formation region and a second impurity semiconductor layer which is in contact with a wiring layer; a semiconductor layer which serves as the channel formation region and the first impurity semiconductor layer preferably contact each other in a region where they overlap the gate electrode; and the first impurity semiconductor layer and the second impurity semiconductor layer preferably contact each other in a region where they do not overlap the gate electrode. |
申请公布号 |
JP2011009730(A) |
申请公布日期 |
2011.01.13 |
申请号 |
JP20100120563 |
申请日期 |
2010.05.26 |
申请人 |
SEMICONDUCTOR ENERGY LAB CO LTD |
发明人 |
MIYAIRI HIDEKAZU;JINBO YASUHIRO;GOTO HIROMITSU;MIZOGUCHI TAKAFUMI;FURUKAWA SHINOBU |
分类号 |
H01L29/786;G02F1/1368;H01L21/336 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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