发明名称 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a technology that can accurately determine the flowing-down state of liquid through image processing without providing a member not directly related to the processing.SOLUTION: A substrate processing apparatus photographs an image including an area B1 on a top face of a substrate W overlapping with a flowing-down path of a liquid Lq extending from a nozzle 43 to the top face of the substrate W, and an image including an area B2 not overlapping with the flowing-down path, and when a difference in a first image area B1 between the images photographed respectively in a first time and a second time different from each other is larger than a predetermined first threshold, and a difference in a second image area B1 between the images photographed respectively in the first time and the second time is smaller than a predetermined second threshold, determines that the flowing-down state of the liquid has been changed between the first time and the second time.SELECTED DRAWING: Figure 7
申请公布号 JP2016122681(A) 申请公布日期 2016.07.07
申请号 JP20140260128 申请日期 2014.12.24
申请人 SCREEN HOLDINGS CO LTD 发明人 KITAMURA KAZUHIRO
分类号 H01L21/304;B05C5/00;B05C11/00;B05C11/08;B05D1/40;B05D3/00;G03F7/16;H01L21/027;H01L21/306 主分类号 H01L21/304
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