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发明名称
Lithografischer Apparat mit zwei Trägerplatten und Verfahren zur Herstellung einer Vorrichtung
摘要
申请公布号
DE602006018552(D1)
申请公布日期
2011.01.13
申请号
DE200660018552T
申请日期
2006.04.07
申请人
ASML NETHERLANDS B.V.
发明人
LOOPSTRA, ERIK ROELOF;BENSCHOP, JOZEF PETRUS HENRICUS;VAN DEN BRINK, MARINUS AAERT
分类号
G03F7/20
主分类号
G03F7/20
代理机构
代理人
主权项
地址
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