METHOD OF MANUFACTURING SEMICONDUCTOR AND SUBSTRATE PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To adjust the transfer environment of a substrate in order to prevent contamination of a substrate surface by impurities.SOLUTION: A substrate processing method includes steps of: transferring the substrate from a spare chamber 1 to a processing chamber 2 through a transfer chamber 3; processing the substrate in the processing chamber; and transferring the processed substrate from the processing chamber 2 to the spare chamber 1 through the transfer chamber 3. At each step transferring the substrate, all exhaust systems connected to respective chambers are evacuated by using a vacuum pump, while an inert gas is supplied to all the chambers communicating to respective chambers in which the substrate resides.