发明名称 |
FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.
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申请公布号 |
US2011005603(A1) |
申请公布日期 |
2011.01.13 |
申请号 |
US20100820991 |
申请日期 |
2010.06.22 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
PATEL HRISHIKESH;JACOBS JOHANNES HENRICUS WILHELMUS;LIEBREGTS PAULUS MARTINUS MARIA;VAN DER HAM RONALD;SIMONS WILHELMUS FRANCISCUS JOHANNES;DIRECKS DANIEL JOZEF MARIA;JANSSEN FRANCISCUS JOHANNES JOSEPH;BERKVENS PAUL PETRUS JOANNES;BRANDS GERT-JAN GERARDUS JOHANNES THOMAS;STEFFENS KOEN;LEMPENS HAN HENRICUS ALDEGONDA;VAN LIEROP MATHEUS ANNA KAREL;DE METSENAERE CHRISTOPHE;MIRANDA MARCIO ALEXANDRE CANO;SPRUYTENBURG PATRICK JOHANNES WILHELMUS;VERSTRAETE JORIS JOHAN ANNE-MARIE;BLOKS RUUD HENDRICUS MARTINUS JOHANNES |
分类号 |
F03B11/00 |
主分类号 |
F03B11/00 |
代理机构 |
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代理人 |
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地址 |
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