发明名称 METHOD AND SYSTEM FOR PRODUCING MONOSILANE
摘要 The invention relates to a system for producing monosilane, comprising a reaction column (100) having a feed pipe (101) for trichlorosilane and a discharge pipe (102) for silicon tetrachloride that develops, and at least one condenser (103), by way of which the produced monosilane can be removed from the reaction column, wherein the reaction column comprises at least two reactive/distillative reaction regions (104, 105), which are operated at different temperatures and contain different catalytically acting solids. Furthermore a method for producing monosilane by the catalytic disproportioning of trichlorosilane is described, wherein the disproportioning is carried out in at least two reactive/distillative reaction regions (104, 105) operated at different temperatures and containing different catalytically acting solids.
申请公布号 WO2011003949(A1) 申请公布日期 2011.01.13
申请号 WO2010EP59748 申请日期 2010.07.07
申请人 SCHMID SILICON TECHNOLOGY GMBH;PETRIK, ADOLF;SCHMID, CHRISTIAN;HAHN, JOCHEM 发明人 PETRIK, ADOLF;SCHMID, CHRISTIAN;HAHN, JOCHEM
分类号 B01D3/00;C01B33/04 主分类号 B01D3/00
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