发明名称 P0SITION MEASUREMENT APPARATUS AND P0SITION MEASURING METHOD
摘要 <p>PURPOSE: A position measurement apparatus and a position measuring method are provided to measure the length of a measurement target object even when the measurement range of the measurement target object is narrow or wide. CONSTITUTION: A position measurement apparatus is provided to a photographing device(50), an extraction unit(74) and a detector(76) and a measurement unit(78). The photographing device has a photographing region which has a size smaller than a measurement target object(26), and the extraction unit extracts the shape of a surface(32) of the measurement target object from the image within the photographing region. The detector detects the variation of the extracted shape, and the position of the measurement target object on the surface is measured based on the variation detected by the detector.</p>
申请公布号 KR20110004289(A) 申请公布日期 2011.01.13
申请号 KR20100063455 申请日期 2010.07.01
申请人 SMC CORPORATION 发明人 AKI TOMOHIKO
分类号 G01B11/00;G06T7/60 主分类号 G01B11/00
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