发明名称 SALT FOR USE IN ACID GENERATING AGENT, AND RESIST COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a salt forming a pattern of excellent resolution, shape and line-edge roughness, and a resist composition or the like containing the salt.SOLUTION: The salt is represented by formula (I-BB). In the formula, Qand Qeach represents a fluorine atom or a perfluoroalkyl group; Xrepresents a single bond or -[CH]-, provided that k is an integer of 1-17; Yrepresents an aliphatic hydrocarbon group, an alicyclic hydrocarbon group, or an aromatic hydrocarbon group; Aand Aeach represents an aliphatic hydrocarbon group, an alicyclic hydrocarbon group or an aromatic hydrocarbon group, provided that Aand Atogether may form a ring; Arrepresents a (m+1)-valent aromatic hydrocarbon group; Brepresents a single bond or an alkylene group; Brepresents a group that cannot be eliminated by the action of an acid, and is an alicyclic hydrocarbon group comprising an -OXgroup; Xrepresents a hydrogen atom, or a group that can be eliminated by the action of an acid; and mand meach represents an integer of 0-2, mrepresents an integer of 1-3, and mrepresents an integer of 1-3.
申请公布号 JP2011006399(A) 申请公布日期 2011.01.13
申请号 JP20100120686 申请日期 2010.05.26
申请人 SUMITOMO CHEMICAL CO LTD 发明人 ICHIKAWA KOJI;SUGIHARA MASAKO;MASUYAMA TATSURO
分类号 C07C381/12;C07C309/17;C09K3/00;G03F7/004;G03F7/039;H01L21/027 主分类号 C07C381/12
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