| 摘要 |
PROBLEM TO BE SOLVED: To provide a pellicle frame that can decrease as much as possible deformation of an exposure master plate due to deformation of the pellicle frame even if a pellicle is affixed to the exposure master plate, and to provide a lithographic pellicle having the pellicle frame.SOLUTION: The pellicle frame includes a pellicle frame having a cross-section with a shape that has a curved line-containing recess in at least one side edge of a quadrilateral having an upper edge and a lower edge parallel to each other, and an area of no greater than 20 mm. There is also provided a lithographic pellicle that includes a pellicle film stretched over one end face of the pellicle frame via a pellicle film adhesive, and that includes an exposure master plate adhesive on the other end face. Preferably, the curved line is selected from convex curved lines formed from a circle, an ellipsoid, a hyperbola and a parabola. |
