发明名称 VERTICAL-STRUCTURE GALLIUM-NITRIDE-BASED LIGHT EMITTING DIODE ELEMENT, AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a vertical-structure gallium-nitride-based light emitting diode element, and a manufacturing method of the element.SOLUTION: The vertical-structure gallium-nitride-based light emitting diode element are manufactured through processes of: forming a light emitting structure of the sequence lamination comprising an n-type gallium-nitride-based semiconductor layer, an active layer, and a p-type gallium-nitride-based semiconductor layer on a substrate; etching the light emitting structure and dividing it into unit-size LED elements; forming a p-type electrode on the divided light emitting structure; filling a space between the divided light emitting structures with non-conductive materials; forming a metal seed layer on the resultant structure; forming a first plated layer on the metal seed layer, except for the intermediate regions interposed between the light emitting structures; forming second plated layers on the surface of the first plated layer and on the metal seed layer interposed between the first plated layers; separating the substrate from the light emitting structure; removing the non-conductive material interposed between the light emitting structures exposed by the separated substrate; forming an n-type electrode on the n-type gallium-nitride-based semiconductor layer; and removing the portions of the metal seed layer and the second plated layer which are interposed between the light emitting structures.
申请公布号 JP2011009796(A) 申请公布日期 2011.01.13
申请号 JP20100232347 申请日期 2010.10.15
申请人 SAMSUNG LED CO LTD 发明人 LEE SU YEOL;O BANWON;BAIK DOO GO;JANG TAE SUNG;WOO JONG GUN;CHOI SEOK BEOM;YOON SANG HO;KIM DONU;YEO IN TAE
分类号 H01L33/38;H01L33/06;H01L33/10;H01L33/14;H01L33/22;H01L33/32;H01L33/40 主分类号 H01L33/38
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