| 摘要 |
PROBLEM TO BE SOLVED: To quickly and reliably separate a substrate from an exposure mask.SOLUTION: In each of an exposure stage 1 and an upper frame 2, a pusher 12 protruding to push one end of the substrate 10 in the direction to separate it from the exposure mask 11 is arranged, and a nozzle 21 jetting a gas between the substrate 10 and the exposure mask 11 is formed in the pusher 12. The pusher 12 is installed in the position for pushing the end of the substrate 10, while the nozzle 21 is formed to jet the gas toward the center of the substrate 10 to be separated. The gas jetted from the nozzle 21 is an ionized gas having a static electricity removal effect. |
