发明名称 PHOTOMASK AND METHOD FOR PRODUCING OPTICAL ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a photomask that expresses a large number of grayscale levels even in a gray tone mask having a binary pattern composed of a light-transmitting region and a light-shielding region.SOLUTION: The photomask includes a unit region 30, in which a plurality of small regions 20, each having a light-transmitting region 22 and a light-shielding region 24 and having an area smaller than an area corresponding to the resolution of an exposure apparatus, and the areas of the light-transmitting regions 22 or the light-shielding regions 24 being different from each other, are arranged in a combination in accordance with a grayscale level by using Bayer's matrix by a structural dither method in such a manner that the total area of the light-transmitting regions 22 or of the light-shielding regions 24 differs for each grayscale level.
申请公布号 JP2011008118(A) 申请公布日期 2011.01.13
申请号 JP20090152858 申请日期 2009.06.26
申请人 FUJI XEROX CO LTD 发明人 NAKAMURA SHIGETOSHI;HAYASHI KAZUHIRO;KIKUCHI TAKASHI;THAPLIYA ROSHAN
分类号 G02B3/00;G03F1/00;G03F1/68;H01L21/027 主分类号 G02B3/00
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