| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device including an alignment mark which can be precisely detected.SOLUTION: The semiconductor device includes the alignment mark for a lithography manufacturing process. The alignment mark has a plurality of bar marks 10 which are arranged at a predetermined interval along a scanning direction of a detection beam. Each of the plurality of bar marks 10 has a plurality of wiring marks 11 which are arranged at a predetermined interval along a first direction orthogonal to the scanning direction. An interval WS between mutually adjacent wiring marks 11 is shorter than a wavelength of the detection beam within a range of a design constraint of the semiconductor device. |
