| 摘要 |
PROBLEM TO BE SOLVED: To provide a salt, a resist composition or the like which can form a pattern excellent in an outstanding resolution, a mask error factor and a focus margin.SOLUTION: The salt is represented by formula (I-AA). In the formula, Qand Qeach represent a fluorine atom or a perfluoroalkyl group; Xrepresents a single bond or -[CH]-, and k is an integer of 1-17; Yrepresents an aliphatic hydrocarbon group, an alicyclic hydrocarbon group or an aromatic hydrocarbon group; Aand Arepresent an aliphatic hydrocarbon group, an alicyclic hydrocarbon group or aromatic hydrocarbon group, or Aand Amay together form a ring; Arrepresents a (m+1)-valent aromatic hydrocarbon group; Brepresents a single bond or an alkylene group; Brepresents a group which cannot be eliminated by action of an acid and a lactone ring which may be substituted; mand mrepresent an integer of 0-2, mrepresents an integer of 1-3, and mrepresents an integer of 1-3. |
