| 摘要 |
PROBLEM TO BE SOLVED: To provide a transfer sheet, having, on a base material film, a release film prepared with a release layer and a transfer layer prepared on a release layer of the release film, which is very useful in the points that the release layer excels in the uniformity of its film thickness and, at the same time, the release layer excels in the adhesion quality with the base material film and in the smoothness of its surface and is high in water repellency and has the uniform releasability of the release layer and the transfer layer during thermal transfer.SOLUTION: The release layer of the transfer sheet including a base material film, the release layer and the transfer layer consists of a continuous thin film layer of a silicon oxide which is formed by using a gas composition containing at least steam of an organic silicon compound and oxygen gas through chemical vapor deposition in a plasma chemical vapor deposition process using a plasma generating apparatus. Further, the continuous thin film layer of a silicon oxide includes at least one kind of compound comprising one or, two or more kinds selected from carbon, hydrogen, silicon and oxygen. |
