Methods of depositing boron-containing liner layers on substrates involve the formation of a bilayer including an initiation layer which includes barrier material to inhibit the diffusion of boron from the bilayer into the underlying substrate.
申请公布号
WO2011005433(A2)
申请公布日期
2011.01.13
申请号
WO2010US38713
申请日期
2010.06.15
申请人
APPLIED MATERIALS, INC.;BALSEANU, MIHAELA;XIA, LI-QUN;WITTY, DEREK, R;CHEN, YI
发明人
BALSEANU, MIHAELA;XIA, LI-QUN;WITTY, DEREK, R;CHEN, YI