发明名称 POLYMER PRODUCTION METHOD, POLYMER FOR USE IN LITHOGRAPHY, RESIST COMPOSITION AND SUBSTRATE PRODUCTION METHOD
摘要 <p>Disclosed is a production method for a polymer. The polymer can reduce or eliminate variations in molecular weight and in the percentage of constitutional units contained in a copolymer, and can improve solubility in solvents and improve sensitivity when used in a resist composition. The polymer production method comprises a polymerisation step, whereby polymers are obtained through the polymerisation of two or more kinds of monomers during the drip-feeding of monomers and a polymerisation initiator into a reactor. During the first stage of the polymerisation step a first solution, which contains monomers in a first composition, is supplied. The dropping of a second solution, which contains monomers in a second composition, is initiated either after or at the same time as the initiation of the supply of the first solution. The second composition is the same as the target composition of the desired polymer. The first composition is a composition that is determined beforehand, taking into account the target composition and the reactivity of each monomer present in the polymer. Also, the drip-feeding speed of the polymerisation initiator during the first stage of the polymerisation process is increased.</p>
申请公布号 WO2011004840(A1) 申请公布日期 2011.01.13
申请号 WO2010JP61534 申请日期 2010.07.07
申请人 MITSUBISHI RAYON CO., LTD.;YASUDA ATSUSHI;OSHIKIRI TOMOYA;MATSUMOTO DAISUKE;KATOU KEISUKE;MAEDA SHINICHI 发明人 YASUDA ATSUSHI;OSHIKIRI TOMOYA;MATSUMOTO DAISUKE;KATOU KEISUKE;MAEDA SHINICHI
分类号 C08F2/00;C08F220/10;G03F7/26 主分类号 C08F2/00
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