发明名称 Photovoltaic Device and Manufacturing Method Thereof
摘要 A photovoltaic device with a low degradation rate and a high stability efficiency. In one aspect, the photovoltaic device includes: a substrate; a first electrode disposed on the substrate; at least one photoelectric transformation layer disposed on the first electrode, the photoelectric transformation layer including a light absorbing layer; and a second electrode disposed on the photoelectric transformation layer; wherein the light absorbing layer includes the first sub-layer and the second sub-layer, the first sub-layer including hydrogenated micro-crystalline silicon germanium (μc-SiGe:H) and an amorphous silicon germanium network (a-SiGe:H) formed among the hydrogenated micro-crystalline silicon germaniums, the second sub-layer including hydrogenated micro-crystalline silicon (μc-Si:H) and an amorphous silicon network (a-Si:H) formed among the hydrogenated micro-crystalline silicons.
申请公布号 US2011005588(A1) 申请公布日期 2011.01.13
申请号 US20100762978 申请日期 2010.04.19
申请人 MYONG SEUNG-YEOP 发明人 MYONG SEUNG-YEOP
分类号 H01L31/00;H01L31/0224;H01L31/0312;H01L31/18 主分类号 H01L31/00
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