发明名称 LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD AND STORAGE MEDIUM
摘要 PURPOSE: A liquid processing apparatus, a liquid processing method, and a storage media are provided to maintain the yield by preventing a processing liquid from dropping on a substrate and a substrate supporting part. CONSTITUTION: Liquid processing parts(11a to 11c) comprises a spin chuck(12a) in a cup with an opening in order to horizontally support a substrate. A resist supplying part(3) comprises a driving unit(31), an arm(33), and a collecting nozzle(40). A processing liquid nozzle is installed to a support in order to supply the processing liquid to the substrate. A nozzle bath(29) is installed to set the processing liquid nozzle to be stood by. A support driving unit moves the processing liquid nozzle.
申请公布号 KR20110004278(A) 申请公布日期 2011.01.13
申请号 KR20100060172 申请日期 2010.06.24
申请人 TOKYO ELECTRON LIMITED 发明人 SEKIMOTO EIICHI;KOMETANI YASUYUKI;OHTO TAKESHI
分类号 H01L21/027;H01L21/302 主分类号 H01L21/027
代理机构 代理人
主权项
地址