发明名称 THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF FABRICATING THEREOF
摘要 PURPOSE: A thin film transistor substrate and a method for fabricating the same are provided to improve the electric characteristics including an oxide active layer pattern by forming a protection layer which excludes hydrogen. CONSTITUTION: Gate wires(22,26) are formed on an insulation substrate(10), and oxide active patterns(42,44) are formed in the gate wires. Data wires(62,65,66,67) cross the gate wires on the oxide active pattern layer. A protection layer(70) is formed between the oxide active pattern and the data wires.
申请公布号 KR20110003801(A) 申请公布日期 2011.01.13
申请号 KR20090061249 申请日期 2009.07.06
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 YOON, KAP SOO;KIM, DO HYUN;YANG, SUNG HOON;JEONG, KI HUN;CHOI, JAE HO;SEO, SEUNG MI
分类号 G02F1/136 主分类号 G02F1/136
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