发明名称 |
THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF FABRICATING THEREOF |
摘要 |
PURPOSE: A thin film transistor substrate and a method for fabricating the same are provided to improve the electric characteristics including an oxide active layer pattern by forming a protection layer which excludes hydrogen. CONSTITUTION: Gate wires(22,26) are formed on an insulation substrate(10), and oxide active patterns(42,44) are formed in the gate wires. Data wires(62,65,66,67) cross the gate wires on the oxide active pattern layer. A protection layer(70) is formed between the oxide active pattern and the data wires. |
申请公布号 |
KR20110003801(A) |
申请公布日期 |
2011.01.13 |
申请号 |
KR20090061249 |
申请日期 |
2009.07.06 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
YOON, KAP SOO;KIM, DO HYUN;YANG, SUNG HOON;JEONG, KI HUN;CHOI, JAE HO;SEO, SEUNG MI |
分类号 |
G02F1/136 |
主分类号 |
G02F1/136 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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