发明名称 |
RESIN COMPOSITION, METHOD FOR PRODUCING BIOCHIP, AND BIOCHIP |
摘要 |
PROBLEM TO BE SOLVED: To provide a resin composition suitable for production of biochips, with which a resin composition layer excellent in diffusion controllability of an acid generated by exposure can be formed and various kinds of polymers can be stably and accurately formed with high density on a substrate even when exposure amount is low, and to provide a method for producing biochips by using the composition.SOLUTION: The resin composition for production of biochips contains (A) a polymer and (B) a radiation-sensitive acid generator that generates a sulfonyl anion by an action of light, wherein the sulfonyl anion is a bicyclic compound having optical purity of not less than 10%ee. |
申请公布号 |
JP2011006556(A) |
申请公布日期 |
2011.01.13 |
申请号 |
JP20090150233 |
申请日期 |
2009.06.24 |
申请人 |
JSR CORP |
发明人 |
NISHIKAWA KOJI;GOTO HIROFUMI |
分类号 |
C08L101/00;B32B27/18;C08F220/54;C08F220/56;C08F220/58;C08F220/60;C08K5/42;C08L33/26;G01N33/551;G01N37/00;G03F7/004;G03F7/039;G03F7/095;G03F7/40 |
主分类号 |
C08L101/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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