发明名称 FIELD-EFFECT TRANSISTOR ON INSULATING SUBSTRATE, AND INTEGRATED CIRCUIT THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a structure for achieving a bipolar transistor by improving a maximum allowable voltage of an output voltage with respect to a field-effect transistor formed in a semiconductor thin film on an insulating substrate, and an integrated circuit thereof.SOLUTION: A body contact region is sandwiched between source regions in order to achieve a larger maximum allowable voltage with small area. The body contact region and source regions are connected through a conductive thin film or a junction of a low resistance. There is provided a constitution of the transistor consisting of: a drain region and source regions, and a first gate and a body contact region; and a part where first conductivity type second regions are provided side by side, that are a second gate, and source regions and a drain region. Thus, the bipolar transistor having a large channel width is achieved, and there is provided the transistor which can operate with both positive and negative potentials in relation to a conventional body potential, with this constitution.
申请公布号 JP2011009579(A) 申请公布日期 2011.01.13
申请号 JP20090152974 申请日期 2009.06.26
申请人 SEIKO INSTRUMENTS INC;HAYASHI YUTAKA 发明人 HASEGAWA TAKASHI;TAKASU HIROAKI;OSANAI JUN;HAYASHI YUTAKA
分类号 H01L29/786;H01L29/423;H01L29/49 主分类号 H01L29/786
代理机构 代理人
主权项
地址