发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 A semiconductor device according to an embodiment of the present invention includes a substrate, isolation layers and active regions formed in the substrate, and arranged alternately along a first direction parallel to a surface of the substrate, an inter layer dielectric formed on the isolation layers and the active regions, and having holes for respective contact plugs on the respective active regions, barrier layers formed in the holes, each of the barrier layers being formed on a top surface of an active region exposed in a hole and on one of two side surfaces of the hole, the two side surfaces of the hole being perpendicular to the first direction, and plug material layers formed on the barrier layers in the holes.
申请公布号 US2011006435(A1) 申请公布日期 2011.01.13
申请号 US20100833329 申请日期 2010.07.09
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 NISHIHARA KIYOHITO
分类号 H01L23/48;H01L21/768 主分类号 H01L23/48
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