发明名称 GAS BARRIER FILM, METHOD FOR MANUFACTURING GAS BARRIER FILM, AND PHOTOELECTRIC CONVERSION ELEMENT USING GAS BARRIER FILM
摘要 A gas barrier film having extremely high barrier characteristics is manufactured in a roll form, and the film is applied to elements and the like which require gas barrier characteristics, such as a base material for a solar cell. The gas barrier film has, on a base material, a smooth layer and at least one gas barrier layer that contains silicon and oxygen. The gas barrier film is characterized in that the composition ratio (O/Si) of oxygen (O) to silicon (Si) is larger on the surface layer side of the gas barrier layer than that on the base material side of the gas barrier layer, and the composition ratio (O/Si) of oxygen (O) to silicon (Si) on the base material side is 1.90 or higher.
申请公布号 WO2011004698(A1) 申请公布日期 2011.01.13
申请号 WO2010JP60511 申请日期 2010.06.22
申请人 KONICA MINOLTA HOLDINGS, INC.;HIRABAYASHI KAZUHIKO;KAWAMURA TOMONORI;II HIROMOTO 发明人 HIRABAYASHI KAZUHIKO;KAWAMURA TOMONORI;II HIROMOTO
分类号 B32B9/00;C23C18/00;H01L31/042 主分类号 B32B9/00
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