发明名称 |
POLISHING OIL SLURRY FOR POLISHING HARD CRYSTAL SUBSTRATE |
摘要 |
A hard crystal substrate such as a GaN substrate or a SiC substrate is polished by using polishing oil slurry having abrading particles of artificial diamond clusters dispersed in a dispersant. The artificial diamond clusters include approximately spherical agglomerate particles with average particle size D50 of 20 nm or more and 50 nm or less, having primary particles with particle diameters of 2 nm or more and 10 nm or less. A rough polishing process is carried out first such that an average surface roughness of 0.5 nm or more and 1 nm or less is obtained, followed by a finishing process such that the average surface roughness of said surface becomes 0.2 nm or less.
|
申请公布号 |
US2011005143(A1) |
申请公布日期 |
2011.01.13 |
申请号 |
US20100886810 |
申请日期 |
2010.09.21 |
申请人 |
NIHON MICRO COATING CO., LTD. |
发明人 |
AOKI KENJI;YAMAZAKI TORU;WATANABE TAKEHIRO;HAMADA NAOYUKI |
分类号 |
C09K3/14;B24B37/00;B24B37/12;B82Y10/00;B82Y99/00;C09G1/02;H01L21/304 |
主分类号 |
C09K3/14 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|