发明名称 APPARATUS FOR NBTI PREDICTION
摘要 An apparatus comprises a circuit for measuring a gate leakage current of a plurality of transistors. A circuit is provided to apply heat to gates of the plurality of transistors. A circuit is provided to apply a single stress bias voltage to the plurality of transistors for a stress period t. The stress bias voltage is sufficient to cause a 10% degradation in a drive current of the transistor within the stress period t. A processor is provided for estimating a negative bias temperature instability (NBTI) lifetime τ of the transistor based on a relationship between the gate leakage current and one or more of the group consisting of gate voltage, gate length, gate temperature, and gate width of the plurality of transistors. The relationship is determined from data observed while applying the single stress bias voltage.
申请公布号 US2011010117(A1) 申请公布日期 2011.01.13
申请号 US20100887615 申请日期 2010.09.22
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 CHEN CHIA-LIN;LIN Y. M.;CHEN MING-CHEN
分类号 G06F19/00;G01R31/26;G06F17/50 主分类号 G06F19/00
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