| 摘要 |
PURPOSE: A stripper containing an acetal or a ketal for removing post-etched photoresist, etch polymer and residue is provided to remove post-etched organic and inorganic residue as well as polymeric residues from semiconductor substrates. CONSTITUTION: A formulation to remove post-etched organic and inorganic residue and photoresist from semiconductor substrates comprises: an acetal or a ketal solvent; water; a polyhydric alcohol; and a pH adjuster, wherein the formulation has a pH of 7 or higher. The acetal or the ketal solvent having a formula selected from formula I, formula II and combinations thereof, wherein n 1 and R1, R2, R3, R4 and R5 are each independently H, alkyl (including heteroalkyl), or aryl.
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