| 发明名称 |
POLISHING SOLUTION FOR METAL FILMS AND POLISHING METHOD USING THE SAME |
| 摘要 |
<p>A polishing solution for metal films that comprises an oxidizing agent, a metal oxide solubilizer, a metal corrosion preventing agent, a water-soluble polymer and water, wherein the water-soluble polymer is a copolymer of acrylic acid and methacrylic acid, the copolymerization ratio of methacrylic acid in the copolymer being 1-20 mol% based on the total of acrylic acid and methacrylic acid.</p> |
| 申请公布号 |
EP2273537(A1) |
申请公布日期 |
2011.01.12 |
| 申请号 |
EP20090731910 |
申请日期 |
2009.04.13 |
| 申请人 |
HITACHI CHEMICAL COMPANY, LTD. |
发明人 |
HAGA, KOUJI;FUKASAWA, MASATO;NAKAGAWA, HIROSHI;MISHIMA, KOUJI |
| 分类号 |
H01L21/321;C09G1/02 |
主分类号 |
H01L21/321 |
| 代理机构 |
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代理人 |
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| 主权项 |
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