<p>A method for fabricating a pellicle beam splitter includes etching an aperture in a support substrate; bonding a beam splitter substrate to an upper surface of the support substrate so that the beam splitter substrate covers the aperture; and depositing at least one optical coating on the beam splitter substrate. A pellicle beam splitter includes a support substrate, an aperture created in the support substrate using a semiconductor fabrication processes and a beam-splitting coating covering the aperture.</p>
申请公布号
EP2271959(A1)
申请公布日期
2011.01.12
申请号
EP20080755090
申请日期
2008.05.06
申请人
HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
发明人
YEO, JONG-SOUK;MATHAI, SAGI, V.;TAN, MICHAEL, RENNE, TY