Pattern Defect Inspection Method, Photomask Manufacturing Method, and Display Device Substrate Manufacturing Method

摘要

A defect inspection method is adapted to inspect a defect generated in a main pattern (56) of a photomask (50). The main pattern (56) includes a repetitive pattern in which unit patterns are periodically arranged. The method forms, an auxiliary pattern (57) for inspection simultaneously with forming the main pattern (56). The auxiliary pattern (57) includes a repetitive pattern (51) having a period different from that of the main pattern (56). The method irradiates a light onto the auxiliary pattern (57) at a predetermined incident angle and receives diffracted light generated by the auxiliary pattern (57) by an observation apparatus to detect a defect of the auxiliary pattern (57), thereby determining the presence of a defect of the main pattern (56).