发明名称 Spin-dependent tunnelling cell and method of formation thereof
摘要 A Spin-Dependent Tunnelling cell comprises a first barrier layer of a first material and a second barrier layer of a second material sandwiched between a first ferromagnetic layer and a second ferromagnetic layer. The first and second barrier layers are formed to a combined thicknesses so that a Tunnelling Magnetoresistance versus voltage characteristic of the cell has a maximum at a non-zero bias voltage.
申请公布号 US7867788(B2) 申请公布日期 2011.01.11
申请号 US20080067585 申请日期 2008.03.20
申请人 FREESCALE SEMICONDUCTOR, INC.;CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS);STMICROELECTRONICS (CROLLES 2) SAS 发明人 BUTTET DE COME;HEHN MICHEL;ZOLL STEPHANE
分类号 H01L21/00 主分类号 H01L21/00
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