发明名称 |
Lithographic apparatus, source, source controller and control method |
摘要 |
A lithographic apparatus is disclosed that has a plurality of control circuits, each control circuit arranged to be connected to an associated radiation source of a plurality of radiation sources configured to generate pulses of radiation for projection onto a substrate and each control circuit arranged to control the energy of radiation pulses generated by that associated radiation source.
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申请公布号 |
US7868999(B2) |
申请公布日期 |
2011.01.11 |
申请号 |
US20060501912 |
申请日期 |
2006.08.10 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
HEINTZE JOHANNES;BUURMAN ERIK PETRUS;TRENTELMAN MARK |
分类号 |
G03B27/54 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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