发明名称 |
Method for manufacturing pattern formed structure |
摘要 |
The main object of the present invention is to provide a method for manufacturing efficiently a pattern formed structure which has a surface having a property-varied pattern and can be used to manufacture a color filter or the like. In order to achieve the object, the present invention provides a method for manufacturing a pattern formed structure, comprising: a patterning substrate preparing process of preparing a patterning substrate having a base material and a property variable layer which is formed on the base material and has a property variable by action of a photocatalyst based on irradiation with energy; and an energy radiating process of arranging a photocatalyst containing layer side substrate having a base body and a photocatalyst containing layer comprising at least the photocatalyst, and the patterning substrate so as to keep a given interval between the photocatalyst containing layer and the property variable layer, and then radiating energy onto the resultant at an intensity of 0.1 to 10 mW/cm2, thereby forming a property variable pattern in which the property of the property variable layer is varied.
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申请公布号 |
US7867925(B2) |
申请公布日期 |
2011.01.11 |
申请号 |
US20050100054 |
申请日期 |
2005.04.06 |
申请人 |
DAI NIPPON PRINTING CO., LTD. |
发明人 |
KOBAYASHI HIRONORI;UNO YUSUKE |
分类号 |
G02B5/20;H01L21/00;H01L51/50;H05B33/10;H05B33/12;H05B33/14;H05K3/10 |
主分类号 |
G02B5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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