发明名称 Method for manufacturing pattern formed structure
摘要 The main object of the present invention is to provide a method for manufacturing efficiently a pattern formed structure which has a surface having a property-varied pattern and can be used to manufacture a color filter or the like. In order to achieve the object, the present invention provides a method for manufacturing a pattern formed structure, comprising: a patterning substrate preparing process of preparing a patterning substrate having a base material and a property variable layer which is formed on the base material and has a property variable by action of a photocatalyst based on irradiation with energy; and an energy radiating process of arranging a photocatalyst containing layer side substrate having a base body and a photocatalyst containing layer comprising at least the photocatalyst, and the patterning substrate so as to keep a given interval between the photocatalyst containing layer and the property variable layer, and then radiating energy onto the resultant at an intensity of 0.1 to 10 mW/cm2, thereby forming a property variable pattern in which the property of the property variable layer is varied.
申请公布号 US7867925(B2) 申请公布日期 2011.01.11
申请号 US20050100054 申请日期 2005.04.06
申请人 DAI NIPPON PRINTING CO., LTD. 发明人 KOBAYASHI HIRONORI;UNO YUSUKE
分类号 G02B5/20;H01L21/00;H01L51/50;H05B33/10;H05B33/12;H05B33/14;H05K3/10 主分类号 G02B5/20
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