发明名称 Electron beam writing method, fine pattern writing system, and manufacturing method of uneven pattern carrying substrate
摘要 A fine pattern which includes servo patterns, each constituted by servo elements, and groove patterns, each for separating adjacent data tracks, is formed on a substrate applied with a resist and placed on a rotation stage by scanning an electron beam on the substrate. While rotating the substrate in one direction, the electron beam is scanned so as to completely fill servo elements corresponding to a plurality of tracks one by one during one rotation of the substrate by X-Y deflecting the electron beam and vibrating back and forth in the radius direction. Each groove pattern is set as a line-up of a plurality of groove elements divided at a predetermined angle, and groove elements corresponding to the plurality of tracks following the writing of the servo elements are sequentially written by deflection scanning the electron beam largely in a circumferential direction during the same rotation.
申请公布号 US7868308(B2) 申请公布日期 2011.01.11
申请号 US20090359418 申请日期 2009.01.26
申请人 FUJIFILM CORPORATION 发明人 KOMATSU KAZUNORI;USA TOSHINORI
分类号 G21K5/10;G01Q10/04;H01J37/08 主分类号 G21K5/10
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