发明名称 Split gate non-volatile flash memory cell having a floating gate, control gate, select gate and an erase gate with an overhang over the floating gate, array and method of manufacturing
摘要 An improved split gate non-volatile memory cell is made in a substantially single crystalline substrate of a first conductivity type, having a first region of a second conductivity type, a second region of the second conductivity type, with a channel region between the first region and the second region in the substrate. The cell has a select gate above a portion of the channel region, a floating gate over another portion of the channel region, a control gate above the floating gate and an erase gate adjacent to the floating gate. The erase gate has an overhang extending over the floating gate. The ratio of the dimension of the overhang to the dimension of the vertical separation between the floating gate and the erase gate is between approximately 1.0 and 2.5, which improves erase efficiency.
申请公布号 US7868375(B2) 申请公布日期 2011.01.11
申请号 US20090618632 申请日期 2009.11.13
申请人 SILICON STORAGE TECHNOLOGY, INC. 发明人 LIU XIAN;LEVI AMITAY;KOTOV ALEXANDER;TKACHEV YURI;MARKOV VIKTOR;JIA JAMES YINGBO;SU CHIEN SHENG;HU YAW WEN
分类号 H01L29/788 主分类号 H01L29/788
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