发明名称 Structure and method for placement, sizing and shaping of dummy structures
摘要 A material layer on a substrate being processed, e.g. to form chips, includes one or more functional structures. In order to control pattern density during fabrication of the chip, dummy fill structures of different sizes and shapes are added to the chip at different distances from the functional structures of the material layer. In particular, the placement, size and shape of the dummy structures are determined as a function of a distance to, and density of, the functional structures of the material layer.
申请公布号 US7868427(B2) 申请公布日期 2011.01.11
申请号 US20090353193 申请日期 2009.01.13
申请人 INFINEON TECHNOLOGIES AG 发明人 SCHMIDT SEBASTIAN;LIU HANG-YIP;SCHAFBAUER THOMAS;WEI YAYI
分类号 H01L21/76;G06F17/50;H01L21/027;H01L21/302;H01L21/3105;H01L21/321;H01L21/4763;H01L21/762;H01L21/82;H01L23/544 主分类号 H01L21/76
代理机构 代理人
主权项
地址