发明名称 |
Lithographic apparatus |
摘要 |
Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
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申请公布号 |
US7868998(B2) |
申请公布日期 |
2011.01.11 |
申请号 |
US20080216126 |
申请日期 |
2008.06.30 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
HOOGENDAM CHRISTIAAN ALEXANDER;STREEFKERK BOB;MULKENS JOHANNES CATHARINUS HUBERTUS;BIJLAART ERIK THEODORUS MARIA;KOLESNYCHENKO ALEKSEY YURIEVICH;LOOPSTRA ERIK ROELOF;MERTENS JEROEN JOHANNES SOPHIA MARIA;SLAGHEKKE BERNARDUS ANTONIUS;TINNEMANS PATRICIUS ALOYSIUS JACOBUS;VAN SANTEN HELMAR |
分类号 |
G03B27/42;G03F7/20;B05C11/00;G03B27/52;G03B27/58;H01L21/00;H01L21/027 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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