| 摘要 |
<p>PURPOSE: A coating and developing device is provided to prevent a watermark from being generated, which is caused by a dried liquid on a substrate by installing a humidity control unit on the substrate. CONSTITUTION: A cleaning unit(6) is installed in the return path of a liquid immersion lithographic substrate in an exposure device(37). The cleaning unit comprises a frame body. A return unit carries the substrate in the sidewall part of the frame body. A substrate return device returns a substrate after a liquid immersion lithography process to the cleaning unit by supporting it to a holding support body. A control unit controls the cleaning unit and the substrate return device.</p> |
