| 摘要 |
<p>PURPOSE: An optical noise correction method of an exposure apparatus and a photomask for the same are provided to implement the correction for the optical noise properly by analyzing the profile of a photoresist layer pattern formed on a wafer. CONSTITUTION: A photomask having a test pattern being sensitive to the optical noise is prepared(210). A photoresist layer pattern corresponding to the test pattern is formed on the wafer using the photomask(220). The effect of the optical noise on the profile of the photoresist layer pattern is identified by analyzing the photoresist layer pattern(230).</p> |
