发明名称 GAS SUPPLY UNIT AND GAS SUPPLY APPARATUS
摘要 PURPOSE: A gas supplying unit and a gas supplying apparatus are provided to smoothly transfer the purge gas through a flow path by extending the flow path in the longitudinal direction of a vale mounting surface and forming main flow path thicker than a connection flow path. CONSTITUTION: A flow path is formed on the inside of a flow path block(20). The flow path comprises the main flow path and a plurality of subsidiary flow paths connected to the main flow path. An on-off valve shuts or communicates with the subsidiary flow path and the main flow path. The flow path block comprises a valve top surface(20a) and a subsidiary flow path aperture.
申请公布号 KR20110001944(A) 申请公布日期 2011.01.06
申请号 KR20100061757 申请日期 2010.06.29
申请人 CKD CORPORATION 发明人 KATO KEISUKE;NISHIDA SHIGENOBU;MIWA TOSHIKAZU;INOUE TAKASHI
分类号 H01L21/02 主分类号 H01L21/02
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