| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
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| 申请公布号 |
US2011001942(A1) |
申请公布日期 |
2011.01.06 |
| 申请号 |
US20100698938 |
申请日期 |
2010.02.02 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LOF JOERI;BUTLER ERIK THEODORUS MARIA;BUTLER HANS;DONDERS SJOERD NICOLAAS LAMBERTUS;HOOGENDAM CHRISTIAAN ALEXANDER;KOLESNYCHENKO ALEKSEY;LOOPSTRA ERIK ROELOF;MEIJER HENDRICUS JOHANNES MARIA;MERTENS JEROEN JOHANNES SOPHIA MARIA;MULKENS JOHANNES CATHARINUS HUBERTUS;RITSEMA ROELOF AEILKO SIEBRAND;VAN SCHAIK FRANK;SENGERS TIMOTHEUS FRANCISCUS;SIMON KLAUS;DE SMIT JOANNES THEODOOR;STAAIJER ALEXANDER;STREEFKERK BOB;VAN SANTEN HELMAR |
| 分类号 |
G03B27/58;G03F7/20;H01L21/027 |
主分类号 |
G03B27/58 |
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